LEAD OPTIMA ELEMENT TECH (HUITA MATERIALS)

Contact Us

Tel: +86-18 423 717 818
E-mail: sales@cqoptics.com
Add: No. 5, Torch Ave, Jiulongpo District, Chongqing,400080 China 3rd Zone, Gongdatang, Jiangdong Street, Yiwu City, Zhejiang Province 322099 CHN
Skype: 27393442@qq.com
WeChat: Matrip023
whatsapp: +86 18423717818
Skype: 27393442@qq.com facebook: https://twitter.com/@loptimaH9926 sales@cqoptics.com

Products > Sputtering Targets > Ceramic Targets > ITO (Low density) Sputtering Target
ITO (Low density) Sputtering Target
Product name : ITO (Low density) Sputtering Target
Product No. : 202199141323
Material : In2O3+SnO2
Size : 10*3; 18*8; 24*14; 30*10mm or according to the customer's requirements
Density(g/cm3) : Relative density: 60±2%
Refractive Index : Resistivity ≤1.6X10-4 Ω·cm
Form : Green Tablets
Purity : 4N
Application : ITO conductive film, LCD, LED, etc
←[Previous Product]              [Next Product]→
Online Inquiry         Email Us

  Details:
Production process of ITO target
1. Hot isostatic pressing method
2. Hot pressing method
3. Sintering method
 
Grain size: 5 ~ 15 µ M
Resistivity: 1.2 × 10-4Ω·cm
Linear expansion coefficient: 5.8 × 10-6K-1

  Related Products :

IZO Sputtering Target
IZO Sputtering Target

ITO Target
ITO Target

Rotating Silicon Target
Rotating Silicon Target

IGZO Sputtering Target
IGZO Sputtering Target

TiOx Target
TiOx Target

α-Al203 tablets
α-Al203 tablets

Silicon Carbide Target
Silicon Carbide Target

ITO Rotating Sputtering Target
ITO Rotating Sputtering Target

Online service

Skype: 27393442@qq.com sales@cqoptics.com