HUITA MATERIALS

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E-mail: sales@cqoptics.com
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Products > Sputtering Targets > Ceramic Targets > ITO Rotating Sputtering Target
ITO Rotating Sputtering Target
Product name : ITO Rotating Sputtering Target
Product No. : 202199134353
Material : In2O3+SnO2
Size : ID:133-138mm; OD: 151-169mm; L: 150-260mm or according to the customer's requirements
Density(g/cm3) : Relative density: ≥ 99.5%
Refractive Index : Resistivity ≤1.6X10-4 Ω·cm
Form : Black tube
Purity : 4N
Application : ITO conductive film, LCD, LED, etc
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  Details:
Production process of ITO target
1. Hot isostatic pressing method
2. Hot pressing method
3. Sintering method
 
ITO target is sputtered onto coated glass or other substrates by magnetron sputtering to form ITO film.

Multi-assemblies bonded to copper backing plate is option.

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