HUITA MATERIALS

Contact Us

Tel: +86-18 423 717 818
E-mail: sales@cqoptics.com
Add: 3rd Zone, Gongdatang, Jiangdong Street, Yiwu City, Zhejiang Province 322099 CHN
sales@cqoptics.com

Products > Sputtering Targets > Ceramic Targets > ITO (High density) Sputtering Target
ITO (High density) Sputtering Target
Product name : ITO (High density) Sputtering Target
Product No. : 20219914520
Material : In2O3+SnO2
Size : 10*3; 18*8; 24*14; 30*10mm or according to the customer's requirements
Density(g/cm3) : Relative density: ≥ 99.5%
Refractive Index : Resistivity ≤1.6X10-4 Ω·cm
Form : Black Tablets
Purity : 4N
Application : ITO conductive film, LCD, LED, etc
←[Previous Product]              [Next Product]→
Online Inquiry         Email Us

  Details:
Production process of ITO target
1. Hot isostatic pressing method
2. Hot pressing method
3. Sintering method
 
ITO target is sputtered onto coated glass or other substrates by magnetron sputtering to form ITO film.

Multi-assemblies bonded to copper backing plate is option.

  Related Products :

Silicon Carbide Target
Silicon Carbide Target

ITO Rotating Sputtering Target
ITO Rotating Sputtering Target

ZnS tablet sintering
ZnS tablet sintering

Boron Carbide Target
Boron Carbide Target

ITO (Low density) Sputtering Target
ITO (Low density) Sputtering Target

IZO Sputtering Target
IZO Sputtering Target

ITO Target
ITO Target

Rotating Silicon Target
Rotating Silicon Target

Online service

sales@cqoptics.com