HUITA OPTO-electronic Materials

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E-mail: sales@cqoptics.com
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Products > Sputtering Targets > Ceramic Targets > ITO (High density) Sputtering Target
ITO (High density) Sputtering Target
Product name : ITO (High density) Sputtering Target
Product No. : 20219914520
Material : In2O3+SnO2
Size : 10*3; 18*8; 24*14; 30*10mm or according to the customer's requirements
Density(g/cm3) : Relative density: ≥ 99.5%
Refractive Index : Resistivity ≤1.6X10-4 Ω·cm
Form : Black Tablets
Purity : 4N
Application : ITO conductive film, LCD, LED, etc
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  Details:
Production process of ITO target
1. Hot isostatic pressing method
2. Hot pressing method
3. Sintering method
 
ITO target is sputtered onto coated glass or other substrates by magnetron sputtering to form ITO film.

Multi-assemblies bonded to copper backing plate is option.

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