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Products > Sputtering Targets > Metal Targets > Tantalum Sputtering Target
Tantalum Sputtering Target
Product name : Tantalum Sputtering Target
Product No. : 202199121849
Material : Tantalum
Size : Dia:60-100mm; Thickness: 20-50mm or according to the customer's requirements
Density(g/cm3) : 16.69
Refractive Index : 2.160
Form : Round, Rectangle
Purity : 3N5, 4N
Application : Cathode Sputtering Coating, Sputtering Deposition
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  Details:
Tantalum Sputtering Target
 
Grade : TA1,TA2
Weight : 1 -2 (kg/piece)
State: annealed (m) or hard (y)
Application: CVD evaporation material, sputtering target

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