HUITA OPTO-electronic Materials

Contact Us

Tel: +86-017898626260
Fax: 0086-05795281781
E-mail: sales@cqoptics.com
Add: 3rd Zone, Gongdatang, Jiangdong Street, Yiwu City, Zhejiang Province 322099 CHN
sales@cqoptics.com

Products > Sputtering Targets > Metal Targets > Titanium Aluminum Sputtering Target
Titanium Aluminum Sputtering Target
Product name : Titanium Aluminum Sputtering Target
Product No. : 2021913133227
Material : Ti-Al
Size : Φ98*45; Φ80*50; Φ100*40mm; 70*7; 80*8; 127*10
Density(g/cm3) : 4.51
Refractive Index : 
Form : Round, Multi-arc
Purity : 50:50at% 80:20at% 70:30at%
Application : PVD vacuum coating
←[Previous Product]              [Next Product]→
Online Inquiry         Email Us

  Details:
Titanium aluminum alloy target
 
Process: smelting; HIP
 
Proportion: 50:50at%, 80:20at%, 70:30at%, etc.
 
Purpose: used for vacuum ion plating. Different gases can be added, different colors can be plated and beautiful.
 

  Related Products :

Chromium Aluminum(CrAl) Target
Chromium Aluminum(CrAl) Target

Rotating Titanium Sputtering Target
Rotating Titanium Sputtering Target

Titanium Sputtering Target
Titanium Sputtering Target

Zirconium Sputtering Target
Zirconium Sputtering Target

Tantalum Sputtering Target
Tantalum Sputtering Target

Nickel Sputtering Target
Nickel Sputtering Target

Tantalum Sputtering Target
Tantalum Sputtering Target

Chromium Target
Chromium Target

Online service

sales@cqoptics.com